Please use this identifier to cite or link to this item: https://doi.org/10.1002/adma.201301555
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dc.titleNovel hybrid organic-inorganic spin-on resist for electron- or photon-based nanolithography with outstanding resistance to dry etching
dc.contributor.authorZanchetta, E.
dc.contributor.authorGiustina, G.D.
dc.contributor.authorGrenci, G.
dc.contributor.authorPozzato, A.
dc.contributor.authorTormen, M.
dc.contributor.authorBrusatin, G.
dc.date.accessioned2016-10-18T06:27:26Z
dc.date.available2016-10-18T06:27:26Z
dc.date.issued2013-11-20
dc.identifier.citationZanchetta, E., Giustina, G.D., Grenci, G., Pozzato, A., Tormen, M., Brusatin, G. (2013-11-20). Novel hybrid organic-inorganic spin-on resist for electron- or photon-based nanolithography with outstanding resistance to dry etching. Advanced Materials 25 (43) : 6261-6265. ScholarBank@NUS Repository. https://doi.org/10.1002/adma.201301555
dc.identifier.issn09359648
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/128534
dc.description.abstractA new spin-on alumina-based resist exhibits excellent performance in terms of both achievable lateral resolution and etch resistance in fluorine-based non-cryo-cooled dry etching processes. The resist has selectivity greater than 100:1 with respect to the underlying silicon during the etching process, patternability with various lithographic tools (UV, X-rays, electron beam, and nanoimprint lithography), and positive and negative tone behavior depending only on the developer chemistry. © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1002/adma.201301555
dc.sourceScopus
dc.subjectalumina
dc.subjectdirect patterning
dc.subjectdry etching
dc.subjectetching masks
dc.subjectinorganic resists
dc.subjectsol-gel
dc.typeArticle
dc.contributor.departmentMECHANOBIOLOGY INSTITUTE
dc.description.doi10.1002/adma.201301555
dc.description.sourcetitleAdvanced Materials
dc.description.volume25
dc.description.issue43
dc.description.page6261-6265
dc.description.codenADVME
dc.identifier.isiut000330967800014
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