Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.solmat.2015.02.004
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dc.title0.4% absolute efficiency increase for inline-diffused screen-printed multicrystalline silicon wafer solar cells by non-acidic deep emitter etch-back
dc.contributor.authorPRABIR KANTI BASU
dc.contributor.authorLaw, Felix
dc.contributor.authorShanmugam, Vinodh
dc.contributor.authorKumar, Avishek V Joshi
dc.contributor.authorRichter, Paul J
dc.contributor.authorBottari, Frank J
dc.contributor.authorHoex, Bram
dc.date.accessioned2016-04-29T08:32:27Z
dc.date.available2016-04-29T08:32:27Z
dc.date.issued2015
dc.identifier.citationPRABIR KANTI BASU, Law, Felix, Shanmugam, Vinodh, Kumar, Avishek V Joshi, Richter, Paul J, Bottari, Frank J, Hoex, Bram (2015). 0.4% absolute efficiency increase for inline-diffused screen-printed multicrystalline silicon wafer solar cells by non-acidic deep emitter etch-back. Solar Energy Materials and Solar Cells 137 : 193-201. ScholarBank@NUS Repository. https://doi.org/10.1016/j.solmat.2015.02.004
dc.identifier.issn09270248
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/123696
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1016/j.solmat.2015.02.004
dc.publisherElsevier
dc.typeArticle
dc.contributor.departmentSOLAR ENERGY RESEARCH INST OF S'PORE
dc.description.doi10.1016/j.solmat.2015.02.004
dc.description.sourcetitleSolar Energy Materials and Solar Cells
dc.description.volume137
dc.description.page193-201
dc.identifier.isiut000352670800026
dc.published.stateUnpublished
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