Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.2199976
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dc.titleInterpretation of an anomalous peak in low-temperature photoluminescence measurements of bulk GaAs1-xNx on GaAs
dc.contributor.authorCheah, W.K.
dc.contributor.authorFan, W.J.
dc.contributor.authorYoon, S.F.
dc.contributor.authorLoke, W.K.
dc.contributor.authorLiu, R.
dc.contributor.authorWee, A.T.S.
dc.date.accessioned2014-12-12T07:49:40Z
dc.date.available2014-12-12T07:49:40Z
dc.date.issued2006-05-15
dc.identifier.citationCheah, W.K., Fan, W.J., Yoon, S.F., Loke, W.K., Liu, R., Wee, A.T.S. (2006-05-15). Interpretation of an anomalous peak in low-temperature photoluminescence measurements of bulk GaAs1-xNx on GaAs. Journal of Applied Physics 99 (10) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2199976
dc.identifier.issn00218979
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/116421
dc.description.abstractLow-temperature (10 K) photoluminescence measurements of Ga As1-x Nx epitaxial layers grown on GaAs reveal an anomalous second peak in solid-source molecular beam epitaxy. Rapid thermal annealing (RTA) of a specific GaAsN sample reveals a lower energy peak (γ) which redshifts and a higher energy peak (α) which blueshifts under increasing annealing temperature. The band-anticrossing model is used to identify the origins of the two peaks and we propose a model to explain the RTA observations by the concept of increased confinement in areas of higher N concentrations by trapped N localized states. The γ peak is due to the accumulation of N content near the GaAsGaAsN interface. Hence, this abnormal annealing behavior occurs in layers with nonuniform N concentration at the GaAsNGaAs interface. © 2006 American Institute of Physics.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.2199976
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentINSTITUTE OF ENGINEERING SCIENCE
dc.contributor.departmentPHYSICS
dc.description.doi10.1063/1.2199976
dc.description.sourcetitleJournal of Applied Physics
dc.description.volume99
dc.description.issue10
dc.description.page-
dc.description.codenJAPIA
dc.identifier.isiut000237943800065
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