Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/116112
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dc.titlePatterning of two-dimensional photonic crystal structures by nanoimprint lithography
dc.contributor.authorChen, A.
dc.contributor.authorWang, B.Z.
dc.contributor.authorChua, S.J.
dc.contributor.authorWilhelmi, O.
dc.contributor.authorMahmood, S.B.
dc.contributor.authorSaw, B.T.
dc.contributor.authorKong, J.R.
dc.contributor.authorMoser, H.O.
dc.date.accessioned2014-12-12T07:36:30Z
dc.date.available2014-12-12T07:36:30Z
dc.date.issued2006-08
dc.identifier.citationChen, A.,Wang, B.Z.,Chua, S.J.,Wilhelmi, O.,Mahmood, S.B.,Saw, B.T.,Kong, J.R.,Moser, H.O. (2006-08). Patterning of two-dimensional photonic crystal structures by nanoimprint lithography. International Journal of Nanoscience 5 (4-5) : 559-563. ScholarBank@NUS Repository.
dc.identifier.issn0219581X
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/116112
dc.description.abstractWe report on the process parameters of nanoimprint lithography for the fabrication of two-dimensional (2D) photonic crystals. The nickel mold with 2D photonic crystal patterns covering an area up to 20 mm2 is produced by electron-beam lithography and electroplating. Periodic pillars as high as 200 nm to 250 nm are produced on the mold with the diameters ranging from 180 nm to 500 nm. Optimization of process parameters is essential to generate high-quality nanoscale patterns and control the residual stress in the mold. The mold is employed for nanoimprinting on the polymethyl-methacrylate (PMMA) layer spin-coated on the silicon substrate. Periodic air holes are formed in PMMA above its glass-transition temperature and the patterns on the mold are well transferred. This process can be utilized for commercial applications of photonic crystal devices. © World Scientific Publishing Company.
dc.sourceScopus
dc.subjectNanoimprint lithography
dc.subjectPhotonic crystals
dc.typeConference Paper
dc.contributor.departmentSINGAPORE SYNCHROTRON LIGHT SOURCE
dc.description.sourcetitleInternational Journal of Nanoscience
dc.description.volume5
dc.description.issue4-5
dc.description.page559-563
dc.identifier.isiutNOT_IN_WOS
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