Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.matlet.2004.04.029
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dc.titlePulsed laser deposition and characterization of Bi3.25Nd 0.75Ti3O12 thin films buffered with La 0.7Sr0.3MnO3 electrode
dc.contributor.authorYan, L.
dc.contributor.authorKong, L.B.
dc.contributor.authorOng, C.K.
dc.date.accessioned2014-12-12T07:33:48Z
dc.date.available2014-12-12T07:33:48Z
dc.date.issued2004-09
dc.identifier.citationYan, L., Kong, L.B., Ong, C.K. (2004-09). Pulsed laser deposition and characterization of Bi3.25Nd 0.75Ti3O12 thin films buffered with La 0.7Sr0.3MnO3 electrode. Materials Letters 58 (24) : 2953-2957. ScholarBank@NUS Repository. https://doi.org/10.1016/j.matlet.2004.04.029
dc.identifier.issn0167577X
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/115892
dc.description.abstractBi3.25Nd0.75Ti3O12 (BNT) ferroelectric thin films with a thickness of ∼0.5 μm, on substrates of Pt/Ti/SiO2/Si, (100) SrTiO3 and (100) MgO, with a 0.4-μm-thick La0.7Sr0.3MnO3 (LSMO) layer as bottom electrode, were deposited via pulsed laser deposition. The multilayer thin films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and electrical measurement. The LSMO layers on Pt/Ti/SiO 2/Si were polycrystalline, while those on SrTiO3 and MgO single crystal substrates were highly c-oriented. The BNT films were polycrystalline on LSMO covered Pt/Ti/SiO2/Si and MgO, and c-axis oriented on LSMO/SrTiO3. Dielectric constant and loss tangent (at 1 kHz) of the BNT thin films on LSMO buffered Pt/Ti/SiO2/Si, STO and MgO substrates were 224, 263 and 204, and 0.03, 0.04 and 0.05, respectively. They had a remnant polarization of 25.4, 29.5 and 19.1 μC/cm2, and a coercive field of 133, 176, 134 kV/cm, respectively. No fatigue was found for all the three BNT thin films up to 3×1010 switching cycles. © 2004 Elsevier B.V. All rights reserved.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1016/j.matlet.2004.04.029
dc.sourceScopus
dc.subjectFerroelectric materials
dc.subjectPulsed laser deposition
dc.subjectThin films
dc.typeArticle
dc.contributor.departmentTEMASEK LABORATORIES
dc.contributor.departmentPHYSICS
dc.contributor.departmentINSTITUTE OF ENGINEERING SCIENCE
dc.description.doi10.1016/j.matlet.2004.04.029
dc.description.sourcetitleMaterials Letters
dc.description.volume58
dc.description.issue24
dc.description.page2953-2957
dc.description.codenMLETD
dc.identifier.isiut000223446900003
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