Please use this identifier to cite or link to this item: https://doi.org/10.1016/S0925-9635(03)00025-6
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dc.titleReactive atom beam deposition of boron nitride ultrathin films and nanoparticles using borazine
dc.contributor.authorLoh, K.P.
dc.contributor.authorFan, W.Y.
dc.contributor.authorLim, C.W.
dc.contributor.authorZhang, X.
dc.contributor.authorChen, W.
dc.contributor.authorXie, X.N.
dc.contributor.authorXu, H.
dc.contributor.authorWee, A.T.S.
dc.date.accessioned2014-12-12T07:13:10Z
dc.date.available2014-12-12T07:13:10Z
dc.date.issued2003-03
dc.identifier.citationLoh, K.P., Fan, W.Y., Lim, C.W., Zhang, X., Chen, W., Xie, X.N., Xu, H., Wee, A.T.S. (2003-03). Reactive atom beam deposition of boron nitride ultrathin films and nanoparticles using borazine. Diamond and Related Materials 12 (3-7) : 1103-1107. ScholarBank@NUS Repository. https://doi.org/10.1016/S0925-9635(03)00025-6
dc.identifier.issn09259635
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/115258
dc.description.abstractThe deposition of boron nitride nanomaterials and ultrathin films in high vacuum conditions (1×10-6-1×10-3 Torr) using molecular borazine as well as pre-dissociated borazine has been investigated with the motivation of studying the nucleation efficiency of BN under high vacuum conditions. Molecular borazine displays negligible sticking probability on Si(1 1 1) 7×7 at room temperature. Pre-adsorbing the borazine on silicon at 140 K and subsequent annealing is effective in forming ultrathin hexagonal films on the sample. It is possible to nucleate BN nanomaterials on nickel-sputtered silicon with high efficiency if the borazine is first discharged in a radio-frequency plasma to form reactive radicals. High quality crystalline h-BN thin films, as well as BN nanotubes can be formed on nickel via this approach. © 2002 Elsevier Science B.V. All rights reserved.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1016/S0925-9635(03)00025-6
dc.sourceScopus
dc.subjectBoron nitride
dc.subjectChemical vapor deposition
dc.subjectNanotubes
dc.subjectRadio-frequency plasma
dc.typeArticle
dc.contributor.departmentCHEMISTRY
dc.contributor.departmentNUS NANOSCIENCE & NANOTECH INITIATIVE
dc.contributor.departmentPHYSICS
dc.description.doi10.1016/S0925-9635(03)00025-6
dc.description.sourcetitleDiamond and Related Materials
dc.description.volume12
dc.description.issue3-7
dc.description.page1103-1107
dc.description.codenDRMTE
dc.identifier.isiut000182872000167
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