Please use this identifier to cite or link to this item: https://doi.org/10.1007/s10853-014-8135-1
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dc.titleGeometric confinement of directly deposited features on hydrophilic rough surfaces using a sacrificial layer
dc.contributor.authorLiu, L.
dc.contributor.authorWang, X.
dc.contributor.authorLennon, A.
dc.contributor.authorHoex, B.
dc.date.accessioned2014-11-30T06:41:22Z
dc.date.available2014-11-30T06:41:22Z
dc.date.issued2014
dc.identifier.citationLiu, L., Wang, X., Lennon, A., Hoex, B. (2014). Geometric confinement of directly deposited features on hydrophilic rough surfaces using a sacrificial layer. Journal of Materials Science 49 (12) : 4363-4370. ScholarBank@NUS Repository. https://doi.org/10.1007/s10853-014-8135-1
dc.identifier.issn15734803
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/113247
dc.description.abstractIt is challenging to achieve high definition for inkjet-printed features on hydrophilic rough surfaces. In this study, a spreading diameter of ~5 mm was observed for a 10 pL inkjet droplet when it impacted onto a hydrophilic rough surface. A new geometric confinement method was employed to facilitate a much higher inkjet printing definition in the range of ~50 μm. A layer of water-soluble polyacrylic acid (PAA) was spin-coated onto a hydrophilic rough surface and then inkjet patterned. Subsequently, the PAA was made water-insoluble by subjecting the sample to a heat treatment with temperatures above 170 °C. The change in solubility of PAA during the heat treatment is found to be a crucial factor, which enables the physical confinement of the subsequently inkjet printed aqueous-based droplets. The thickness of the spin-coated sample also plays a critical role in the effectiveness of the physical confinement. The effectiveness of the proposed approach was demonstrated with an inkjet patterning process, in which a dielectric layer of 200 nm SiN x on a textured silicon wafer was selectively etched using 10 pL inkjet-printed droplets resulting in a line width of ~75 μm. When using a 1 pL printhead, the etched line width was as fine as ~30 μm. © 2014 Springer Science+Business Media New York.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1007/s10853-014-8135-1
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentSOLAR ENERGY RESEARCH INST OF S'PORE
dc.description.doi10.1007/s10853-014-8135-1
dc.description.sourcetitleJournal of Materials Science
dc.description.volume49
dc.description.issue12
dc.description.page4363-4370
dc.description.codenJMTSA
dc.identifier.isiut000334074000026
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