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Please use this identifier to cite or link to this item: https://doi.org/10.1116/1.1426364
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dc.titleSubstrate temperature studies of SrBi2(Ta1-xNbx)2O9 grown by pulsed laser ablation deposition
dc.contributor.authorTay, S.T.
dc.contributor.authorHuan, C.H.A.
dc.contributor.authorWee, A.T.S.
dc.contributor.authorLiu, R.
dc.contributor.authorGoh, W.C.
dc.contributor.authorOng, C.K.
dc.contributor.authorChen, G.S.
dc.date.accessioned2014-11-28T09:12:05Z
dc.date.available2014-11-28T09:12:05Z
dc.date.issued2002-01
dc.identifier.citationTay, S.T., Huan, C.H.A., Wee, A.T.S., Liu, R., Goh, W.C., Ong, C.K., Chen, G.S. (2002-01). Substrate temperature studies of SrBi2(Ta1-xNbx)2O9 grown by pulsed laser ablation deposition. Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films 20 (1) : 125-131. ScholarBank@NUS Repository. https://doi.org/10.1116/1.1426364
dc.identifier.issn07342101
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/113106
dc.description.abstractSrBi2(Ta1-xNbx)2O 9 thin films were deposited on Pt/TiOx/SiO2/Si substrates by pulsed laser ablation deposition. Film properties were determined by using x-ray diffraction (XRD), x-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and secondary ion mass spectrometry (SIMS).
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1116/1.1426364
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentPHYSICS
dc.contributor.departmentINSTITUTE OF ENGINEERING SCIENCE
dc.description.doi10.1116/1.1426364
dc.description.sourcetitleJournal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
dc.description.volume20
dc.description.issue1
dc.description.page125-131
dc.description.codenJVTAD
dc.identifier.isiut000173638000020
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