Please use this identifier to cite or link to this item: https://doi.org/10.1016/S0040-6090(03)00833-2
Title: In-plane magnetic anisotropy in RF sputtered Fe-N thin films
Authors: Nie, H.B.
Xu, S.Y. 
Ong, C.K. 
Zhan, Q.
Li, D.X.
Wang, J.P.
Keywords: Directional order
Iron
Magnetic anisotropy
Nitrides
Issue Date: 1-Sep-2003
Citation: Nie, H.B., Xu, S.Y., Ong, C.K., Zhan, Q., Li, D.X., Wang, J.P. (2003-09-01). In-plane magnetic anisotropy in RF sputtered Fe-N thin films. Thin Solid Films 440 (1-2) : 35-40. ScholarBank@NUS Repository. https://doi.org/10.1016/S0040-6090(03)00833-2
Abstract: We have fabricated Fe(N) thin films with varied N2 partial pressure and studied the microstructure, morphology, magnetic properties and resistivity by using X-ray diffraction, atomic force microscopy, transmission electron microscopy, vibrating-sample magnetometer and angle-resolved M-H hysteresis Loop tracer and standard four-point probe method. In the presence of low N2 partial pressure, Fe(N) films showed a basic bcc α-Fe structure with a preferred (110) texture. A variation of in-plane magnetic anisotropy of the Fe(N) films was observed with the changing of N component. The evolution of in-plane anisotropy in the films was attributed to the directional order mechanism. Nitrogen atoms play an important role in refining the α-Fe grains and inducing uniaxial anisotropy. © 2003 Elsevier Science B.V. All rights reserved.
Source Title: Thin Solid Films
URI: http://scholarbank.nus.edu.sg/handle/10635/113084
ISSN: 00406090
DOI: 10.1016/S0040-6090(03)00833-2
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