X-ray-based micro/nanomanufacturing at SSLS - Technology and applications

Abstract

Deep and high-aspect-ratio micro/nanostructures can be accurately patterned in a variety of resists by proximity lithography using high energy, intense, parallel beams of X-rays from synchrotron radiation sources. Using so called LIGA technology, high-aspect-ratio micro/nanostructures can be produced with vertical dimensions ranging from micrometers to millimeters and horizontal dimensions as small as microns. SSLS has set up its LiMiNT facility (Lithography for Micro/Nanotechnology) and is running it partly as a foundry, partly as a research lab. Under the foundry aspect, work is done for customers in various fields of applications. SSLS' own research is focusing on the development of devices and artificial composite materials such as electromagnetic metamaterials. In this paper, the technology capabilities of the LiMiNT facility and application examples are presented. © 2007 American Institute of Physics.