Please use this identifier to cite or link to this item: https://doi.org/10.1117/12.794395
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dc.titleTowards large area THz electromagnetic metamaterials
dc.contributor.authorMoser, H.O.
dc.contributor.authorBahou, M.
dc.contributor.authorChen, A.
dc.contributor.authorHeussler, S.P.
dc.contributor.authorJian, L.K.
dc.contributor.authorKalaiselvi, S.M.P.
dc.contributor.authorLiu, G.
dc.contributor.authorManiam, S.M.
dc.contributor.authorBin Mahmood, S.
dc.contributor.authorGu, P.D.
dc.contributor.authorWen, L.
dc.contributor.authorKong, J.A.
dc.contributor.authorChen, H.S.
dc.contributor.authorCheng, X.X.
dc.contributor.authorWu, B.I.
dc.contributor.authorCasse, B.D.F.
dc.contributor.authorRockstuhl, C.
dc.contributor.authorLederer, F.
dc.date.accessioned2014-11-28T08:43:53Z
dc.date.available2014-11-28T08:43:53Z
dc.date.issued2008
dc.identifier.citationMoser, H.O., Bahou, M., Chen, A., Heussler, S.P., Jian, L.K., Kalaiselvi, S.M.P., Liu, G., Maniam, S.M., Bin Mahmood, S., Gu, P.D., Wen, L., Kong, J.A., Chen, H.S., Cheng, X.X., Wu, B.I., Casse, B.D.F., Rockstuhl, C., Lederer, F. (2008). Towards large area THz electromagnetic metamaterials. Proceedings of SPIE - The International Society for Optical Engineering 7029 : -. ScholarBank@NUS Repository. https://doi.org/10.1117/12.794395
dc.identifier.isbn9780819472496
dc.identifier.issn0277786X
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/113065
dc.description.abstractUp to date, electromagnetic metamaterials (EM3) have been mostly fabricated by primary pattern generation via electron beam or laser writer. Such an approach is time-consuming and may have limitations of the area filled with structures. Especially, electron beam written structures are typically confined to areas of a few 100×100 μm2. However, for meaningful technological applications, larger quantities of good quality materials are needed. Lithography, in particular X-ray deep lithography, is well suited to accomplish this task. Singapore Synchrotron Light Source (SSLS) has been applying its LIGA process that includes primary pattern generation via electron beam or laser writer, X-ray deep lithography and electroplating to the micro/nano-manufacturing of high-aspect ratio structures to produce a variety of EM3 structures. Starting with Pendry's split ring resonators, we have pursued structure designs suitable for planar lithography since 2002 covering a range of resonance frequencies from 1 to 216 THz. More recently, string-like structures have also been included. Latest progress made in the manufacturing and characterization of quasi 3D metamaterials having either split ring or string structures over areas of about ≈1 cm2 extension will be described.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1117/12.794395
dc.sourceScopus
dc.subjectInfrared
dc.subjectLeft-handed materials
dc.subjectMetamaterials
dc.subjectMicrostructure fabrication
dc.subjectSynchrotron radiation
dc.typeConference Paper
dc.contributor.departmentSINGAPORE SYNCHROTRON LIGHT SOURCE
dc.description.doi10.1117/12.794395
dc.description.sourcetitleProceedings of SPIE - The International Society for Optical Engineering
dc.description.volume7029
dc.description.page-
dc.description.codenPSISD
dc.identifier.isiut000262126700004
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