Please use this identifier to cite or link to this item: https://doi.org/10.1117/12.772607
DC FieldValue
dc.titleProton beam writing: A platform technology for nano-integration
dc.contributor.authorVan Kan, J.A.
dc.contributor.authorZhang, F.
dc.contributor.authorBettiol, A.A.
dc.contributor.authorWatt, F.
dc.date.accessioned2014-11-28T06:34:09Z
dc.date.available2014-11-28T06:34:09Z
dc.date.issued2008
dc.identifier.citationVan Kan, J.A., Zhang, F., Bettiol, A.A., Watt, F. (2008). Proton beam writing: A platform technology for nano-integration. Proceedings of SPIE - The International Society for Optical Engineering 6921 : -. ScholarBank@NUS Repository. https://doi.org/10.1117/12.772607
dc.identifier.isbn9780819471062
dc.identifier.issn0277786X
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/112669
dc.description.abstractProton beam writing (p-beam writing) is a process which uses a focused beam of MeV protons to pattern resist material at nanodimensions. This makes p-beam writing the only one tool for fast prototyping of high aspect ratio structures with vertical walls up to 60μm and high aspect ratio values with details down to the 20 nm level. The process, although similar in many ways to direct writing using electrons, nevertheless offers some interesting and unique advantages. Protons, being more massive, have deeper penetration in materials whilst maintaining even energy deposition along a straight path, enabling p-beam writing to fabricate 3D high aspect ratio structures with vertical smooth sidewalls and low line edge roughness. Calculations have also indicated that p-beam writing exhibits minimal proximity effects, since the secondary electrons induced in proton/electron collisions have low energy. A platform technology to integrate 3D nanowires is proposed through high aspect ratio nanofabrication using p-beam writing.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1117/12.772607
dc.sourceScopus
dc.subjectDirect write
dc.subjectHigh aspect ratio
dc.subjectNanolithography
dc.subjectNanowires
dc.subjectProton beam writing
dc.typeConference Paper
dc.contributor.departmentPHYSICS
dc.contributor.departmentNUS NANOSCIENCE & NANOTECH INITIATIVE
dc.description.doi10.1117/12.772607
dc.description.sourcetitleProceedings of SPIE - The International Society for Optical Engineering
dc.description.volume6921
dc.description.page-
dc.description.codenPSISD
dc.identifier.isiut000256898400015
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