Please use this identifier to cite or link to this item: https://doi.org/10.1021/cm8016352
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dc.titleMolecular orientation-dependent ionization potential of organic thin films
dc.contributor.authorChen, W.
dc.contributor.authorHuang, H.
dc.contributor.authorChen, S.
dc.contributor.authorHuang, Y.L.
dc.contributor.authorGao, X.Y.
dc.contributor.authorWee, A.T.S.
dc.date.accessioned2014-11-28T06:33:33Z
dc.date.available2014-11-28T06:33:33Z
dc.date.issued2008-11-25
dc.identifier.citationChen, W., Huang, H., Chen, S., Huang, Y.L., Gao, X.Y., Wee, A.T.S. (2008-11-25). Molecular orientation-dependent ionization potential of organic thin films. Chemistry of Materials 20 (22) : 7017-7021. ScholarBank@NUS Repository. https://doi.org/10.1021/cm8016352
dc.identifier.issn08974756
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/112620
dc.description.abstractOrientation-dependent ionization potentials (IPs) of organic thin films have been investigated with the combination of synchrotron-based high-resolution photoemission spectroscopy and near-edge X-ray absorption fine structure measurements. Organic thin films of copper(II) phthalocyanine (CuPc) and its fully fluorinated counterpart of copper hexadecafluorophthalocyanine (Fi 16CuPc) with well-controlled orientation are used as model systems. Both molecules lie flat on the graphite surface and stand upright on Au(111) terminated by self-assembled monolayer of octane-1-thiol. The IP for the standing-up CuPc thin film (IP = 4.75 eV) is 0.40 eV lower than that of the lying-down film (IP = 5.15 eV). In contrast, the IP of the standing up F 16CuPc (EP = 6.50 eV) is 0.85 eV higher than that of the lying-down film (IP = 5.65 eV). This reversed orientation dependence in IP is explained by the opposite surface dipoles in the standing-up CuPc and F16CuPc molecular layers originating from the different intramolecular dipolar bonds exposed at the surfaces, i.e., a net upward pointing surface dipole in the standing-up CuPc thin film that lowers the IP, and a net downward pointing surface dipole in the standing-up F16CuPc thin film that increases the IP. © 2008 American Chemical Society.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1021/cm8016352
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentPHYSICS
dc.contributor.departmentNUS NANOSCIENCE & NANOTECH INITIATIVE
dc.description.doi10.1021/cm8016352
dc.description.sourcetitleChemistry of Materials
dc.description.volume20
dc.description.issue22
dc.description.page7017-7021
dc.description.codenCMATE
dc.identifier.isiut000261002200018
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