Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.mee.2007.12.005
Title: High aspect ratio micro/nano machining with proton beam writing on aqueous developable - easily stripped negative chemically-amplified resists
Authors: Chatzichristidi, M.
Valamontes, E.
Argitis, P.
Raptis, I.
van Kan, J.A. 
Zhang, F. 
Watt, F. 
Keywords: High aspect ratio
Micromachining
Nanomachining
Proton beam writing
Resist stripping
Issue Date: May-2008
Citation: Chatzichristidi, M., Valamontes, E., Argitis, P., Raptis, I., van Kan, J.A., Zhang, F., Watt, F. (2008-05). High aspect ratio micro/nano machining with proton beam writing on aqueous developable - easily stripped negative chemically-amplified resists. Microelectronic Engineering 85 (5-6) : 945-948. ScholarBank@NUS Repository. https://doi.org/10.1016/j.mee.2007.12.005
Abstract: Proton beam writing (PBW) is a new direct-writing process that uses a focused beam of MeV protons to pattern resist material at nano dimensions. PBW has the unique ability to maintain a straight path through 50 μm thick resist films, and is suitable for high aspect ratio micro(nano)-machining. TADEP resist is a new promising high aspect ratio chemically-amplified resist that can be developed in aqueous base developer and has the capability of stripping in conventional stripping schemes. By employing PBW on TADEP resist patterns with 280 nm linewidth and a thickness of 12 μm have been resolved showing an aspect ratio of 42. Following Ni electroplating of the TADEP features, Ni structures of height 0.8 μm and spacing of 167 nm, produced in 2 μm thick TADEP, were demonstrated indicating the easy stripping characteristics of the TADEP resist. © 2007 Elsevier B.V. All rights reserved.
Source Title: Microelectronic Engineering
URI: http://scholarbank.nus.edu.sg/handle/10635/112605
ISSN: 01679317
DOI: 10.1016/j.mee.2007.12.005
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

SCOPUSTM   
Citations

2
checked on Oct 19, 2020

WEB OF SCIENCETM
Citations

2
checked on Oct 19, 2020

Page view(s)

68
checked on Oct 23, 2020

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.