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Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.tsf.2009.09.063
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dc.titleEffect of bottom electrodes on dielectric properties of high frequency Ba0.5Sr0.5TiO3 parallel plate varactor
dc.contributor.authorSheng, S.
dc.contributor.authorZhang, X.-Y.
dc.contributor.authorWang, P.
dc.contributor.authorOng, C.K.
dc.date.accessioned2014-11-28T01:51:27Z
dc.date.available2014-11-28T01:51:27Z
dc.date.issued2010-03-01
dc.identifier.citationSheng, S., Zhang, X.-Y., Wang, P., Ong, C.K. (2010-03-01). Effect of bottom electrodes on dielectric properties of high frequency Ba0.5Sr0.5TiO3 parallel plate varactor. Thin Solid Films 518 (10) : 2864-2866. ScholarBank@NUS Repository. https://doi.org/10.1016/j.tsf.2009.09.063
dc.identifier.issn00406090
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/111371
dc.description.abstractThree types of Ba0.5Sr0.5TiO3 (BST) thin film parallel plate varactor with different bottom electrodes were fabricated. The bottom electrodes of three types of varactor were perovskite conducting oxide La0.7Sr0.3MnO3 (LSMO), Pt and Au, respectively. Dielectric properties of the BST thin films were characterized in the frequency range from 10 MHz to 15 GHz. The microstructure of the BST thin films was investigated by X-ray diffraction and scanning electron microscope. The microstructural analysis shows that the BST thin films grown on LSMO and Pt bottom electrodes are polycrystalline textured with columnar grains. Dielectric measurement indicates that the BST thin film grown on LSMO bottom electrode has a maximum dielectric constant and a little higher loss tangent. © 2009 Elsevier B.V. All rights reserved.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1016/j.tsf.2009.09.063
dc.sourceScopus
dc.subjectBarium strontium titanate
dc.subjectDielectric properties
dc.subjectMicrowave measurements
dc.subjectParallel plate varactor
dc.subjectPulse laser deposition
dc.subjectThin films
dc.subjectX-ray diffraction
dc.typeArticle
dc.contributor.departmentPHYSICS
dc.contributor.departmentTEMASEK LABORATORIES
dc.description.doi10.1016/j.tsf.2009.09.063
dc.description.sourcetitleThin Solid Films
dc.description.volume518
dc.description.issue10
dc.description.page2864-2866
dc.description.codenTHSFA
dc.identifier.isiut000275920000051
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