Please use this identifier to cite or link to this item: https://doi.org/10.1116/1.1789214
Title: Reactions of ultrathin hard amorphous carbon (a-C) films under microbeam laser processing
Authors: Zhang, L.H.
Gong, H. 
Li, Y.Q.
Wang, J.P.
Issue Date: Nov-2004
Citation: Zhang, L.H., Gong, H., Li, Y.Q., Wang, J.P. (2004-11). Reactions of ultrathin hard amorphous carbon (a-C) films under microbeam laser processing. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 22 (6) : 2239-2245. ScholarBank@NUS Repository. https://doi.org/10.1116/1.1789214
Abstract: The decomposition rate and mechanism of amorphous carbon (a-C) films under laser irradiation were analyzed. Graphitization saturated at early exposures of ∼4 min, while the composition progressed exponentially with the exposure time. It was found that the structure resistance to laser-induced changes increased with the sp s3/sp s2 bonding ratio in the a-C structure. The films sputtered at lower pressure showed higher degree of bonding ratio, higher degree of cross-linking between graphic domains and lower amount of interstitial and weakly bonded compositions. It was also found that reaction rate constant of carbon structure decreases with the bonding ratio in a-C structure.
Source Title: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
URI: http://scholarbank.nus.edu.sg/handle/10635/107181
ISSN: 07342101
DOI: 10.1116/1.1789214
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