Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/107064
Title: High-conductivity p-type transparent copper aluminum oxide film prepared by plasma-enhanced MOCVD
Authors: Wang, Y. 
Gong, H. 
Issue Date: Nov-2000
Citation: Wang, Y.,Gong, H. (2000-11). High-conductivity p-type transparent copper aluminum oxide film prepared by plasma-enhanced MOCVD. Chemical Vapor Deposition 6 (6) : 285-288. ScholarBank@NUS Repository.
Source Title: Chemical Vapor Deposition
URI: http://scholarbank.nus.edu.sg/handle/10635/107064
ISSN: 09481907
Appears in Collections:Staff Publications

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