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|Title:||High-conductivity p-type transparent copper aluminum oxide film prepared by plasma-enhanced MOCVD||Authors:||Wang, Y.
|Issue Date:||Nov-2000||Citation:||Wang, Y.,Gong, H. (2000-11). High-conductivity p-type transparent copper aluminum oxide film prepared by plasma-enhanced MOCVD. Chemical Vapor Deposition 6 (6) : 285-288. ScholarBank@NUS Repository.||Source Title:||Chemical Vapor Deposition||URI:||http://scholarbank.nus.edu.sg/handle/10635/107064||ISSN:||09481907|
|Appears in Collections:||Staff Publications|
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