Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.1771808
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dc.titleFerroelectric and electrical behavior of (Na0.5Bi 0.5)TiO3 thin films
dc.contributor.authorZhou, Z.H.
dc.contributor.authorXue, J.M.
dc.contributor.authorLi, W.Z.
dc.contributor.authorWang, J.
dc.contributor.authorZhu, H.
dc.contributor.authorMiao, J.M.
dc.date.accessioned2014-10-29T08:38:37Z
dc.date.available2014-10-29T08:38:37Z
dc.date.issued2004-08-02
dc.identifier.citationZhou, Z.H., Xue, J.M., Li, W.Z., Wang, J., Zhu, H., Miao, J.M. (2004-08-02). Ferroelectric and electrical behavior of (Na0.5Bi 0.5)TiO3 thin films. Applied Physics Letters 85 (5) : 804-806. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1771808
dc.identifier.issn00036951
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/107040
dc.description.abstractThe growth of polycrystalline (Na0.5Bi0.5)TiO 3(NBT) thin films by radio-frequency magnetron sputtering and their ferroelectric behavior was reported. It was shown that the NBT thin films exhibit a well-defined hysteresis loop, with a remanent polarization of 11.9 μC/cm2 and coercive field of 37.9 kV/cm when measured at room temperature. A change in the controlling mechanism of electrical behavior from the grain interior to the grain boundary for the NBT thin film with increasing temperature was also observed. It was found that hopping of oxygen vacancies trapped at the grain boundaries was responsible for the high dielectric loss at low frequencies.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.1771808
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentMATERIALS SCIENCE
dc.description.doi10.1063/1.1771808
dc.description.sourcetitleApplied Physics Letters
dc.description.volume85
dc.description.issue5
dc.description.page804-806
dc.description.codenAPPLA
dc.identifier.isiut000222969200036
Appears in Collections:Staff Publications

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