Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.1613805
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dc.titleA three-dimensional concurrent atomistic/continuum analysis of an epitaxially strained island
dc.contributor.authorLiu, P.
dc.contributor.authorZhang, Y.W.
dc.contributor.authorLu, C.
dc.date.accessioned2014-10-29T08:37:32Z
dc.date.available2014-10-29T08:37:32Z
dc.date.issued2003-11-15
dc.identifier.citationLiu, P., Zhang, Y.W., Lu, C. (2003-11-15). A three-dimensional concurrent atomistic/continuum analysis of an epitaxially strained island. Journal of Applied Physics 94 (10) : 6350-6353. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1613805
dc.identifier.issn00218979
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/106957
dc.description.abstractThe stress distributions in an epitaxial island were studied by a three dimensional concurrent atomistic/continuum analysis. The island and the adjacent substrate were modeled by molecular dynamics method. Finite element method was used for the analysis. It was found that the nonlinear elasticity based on the atomic potential is required for a smooth stress transition in the overlapping zone.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.1613805
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentMATERIALS SCIENCE
dc.description.doi10.1063/1.1613805
dc.description.sourcetitleJournal of Applied Physics
dc.description.volume94
dc.description.issue10
dc.description.page6350-6353
dc.description.codenJAPIA
dc.identifier.isiut000186276600015
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