Controlled micropatterning of a Si(100) surface by combined nitroxide-mediated and atom transfer radical polymerizations
Xu, F.J. Song, Y. Cheng, Z.P. Zhu, X.L. Zhu, C.X. Kang, E.T. Neoh, K.G.
Song, Y.
Zhu, X.L.
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Abstract
The micropatterning of different polymer brushes, as well as their diblock copolymer brushes on a Si (100) surface using alternating nitroxide-mediated radical polymerization (NMRP) and atom transfer radical polymerization (ATRP) was analyzed. The ATRP initiators were covalently immobilized using robust Si-C bonds in the H-terminated silicon microdomains. The NMRP initiators were coupled to the oxide-covered microdomains of the resist-patterned silicon surface. The results show that the C-Cl bond in the ATRP initiator was relatively stable and did not act as a chain transfer agent during NMRP.
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Source Title
Macromolecules
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Date
2005-07-26
DOI
10.1021/ma050581i
Type
Article