Researcher Profile Statistics: Zhou, Liang
Geo Map
Region
#
NA - North America
1007
AS - Asia, other
767
EU - Europe
205
AF - Africa
3
SA - South America
1
Unknown
9
Total
1992
Country
#
US - United States of America
1004
CN - China
660
AT - Austria
78
SG - Singapore
59
DE - Germany
49
HK - Hong Kong
25
IE - Ireland
15
KR - Korea
12
RU - Russian Federation
10
BA - Bosnia and Herzegovina
9
other - Other Country
71
Total
1992
City
#
Ashburn
561
Shenzhen
169
Beijing
132
Vienna
78
Romeo
60
Mountain View
50
Boardman
46
New York
42
Sunnyvale
30
Shanghai
23
other
801
Total
1992
Most viewed items
#
ID: 101214 - Submicrometer lithography of a silicon substrate by machining of photoresist using atomic force microscopy followed by wet chemical etching
278
Total: {0}
278
Most type viewed
#
ID: other -
0
ID: journal -
1992
ID: conference -
0
ID: patent -
0
ID: allItems -
0
ID: book -
0
ID: dataset -
0
ID: selected -
0
Total
1992
Jan
Feb
Mar
Apr
May
Jun
Jul
Aug
Sep
Oct
Nov
Dec
Tot
2019
0 0
0 48 25 22
12 8 4 11
30 15
175
2020
28 18
15 21 20 10
20 6 1 12
12 29
192
2021
4 41
11 26 22 19
3 7 26 6
34 25
224
2022
21 32
21 21 6 11
32 17 30 28
34 34
287
2023
14 15
24 15 16 51
18 24 11 3
13 19
223
2024
17 57
28 47 0 0
0 0 0 0
0 0
149
Ever
1992
Geo Map
Region | # |
---|---|
NA - North America | 1007 |
AS - Asia, other | 767 |
EU - Europe | 205 |
AF - Africa | 3 |
SA - South America | 1 |
Unknown | 9 |
Total | 1992 |
Country | # |
---|---|
US - United States of America | 1004 |
CN - China | 660 |
AT - Austria | 78 |
SG - Singapore | 59 |
DE - Germany | 49 |
HK - Hong Kong | 25 |
IE - Ireland | 15 |
KR - Korea | 12 |
RU - Russian Federation | 10 |
BA - Bosnia and Herzegovina | 9 |
other - Other Country | 71 |
Total | 1992 |
City | # |
---|---|
Ashburn | 561 |
Shenzhen | 169 |
Beijing | 132 |
Vienna | 78 |
Romeo | 60 |
Mountain View | 50 |
Boardman | 46 |
New York | 42 |
Sunnyvale | 30 |
Shanghai | 23 |
other | 801 |
Total | 1992 |
Most viewed items | # |
---|---|
ID: 101214 - Submicrometer lithography of a silicon substrate by machining of photoresist using atomic force microscopy followed by wet chemical etching | 278 |
Total: {0} | 278 |
Most type viewed | # |
---|---|
ID: other - | 0 |
ID: journal - | 1992 |
ID: conference - | 0 |
ID: patent - | 0 |
ID: allItems - | 0 |
ID: book - | 0 |
ID: dataset - | 0 |
ID: selected - | 0 |
Total | 1992 |
Jan | Feb | Mar | Apr | May | Jun | Jul | Aug | Sep | Oct | Nov | Dec | Tot | |
---|---|---|---|---|---|---|---|---|---|---|---|---|---|
2019 | 0 | 0 | 0 | 48 | 25 | 22 | 12 | 8 | 4 | 11 | 30 | 15 | 175 |
2020 | 28 | 18 | 15 | 21 | 20 | 10 | 20 | 6 | 1 | 12 | 12 | 29 | 192 |
2021 | 4 | 41 | 11 | 26 | 22 | 19 | 3 | 7 | 26 | 6 | 34 | 25 | 224 |
2022 | 21 | 32 | 21 | 21 | 6 | 11 | 32 | 17 | 30 | 28 | 34 | 34 | 287 |
2023 | 14 | 15 | 24 | 15 | 16 | 51 | 18 | 24 | 11 | 3 | 13 | 19 | 223 |
2024 | 17 | 57 | 28 | 47 | 0 | 0 | 0 | 0 | 0 | 0 | 0 | 0 | 149 |
Ever | 1992 |