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Ee Beng, Arthur Tay

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Full Name
Ee Beng, Arthur Tay
Variants
Tay, Arthur
Tay, A.
Tay, E.B.
 
Main Affiliation
 
Faculty
 
Email
eletaya@nus.edu.sg
 

Publications

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Subject:  Photoresist processing

Results 1-16 of 16 (Search time: 0.004 seconds).

Issue DateTitleAuthor(s)
11-Aug-2006A fast in situ approach to estimating wafer warpage profile during thermal processing in microlithographyHu, N.; Tay, A. ; Tsai, K.-Y.
2Feb-2007A lamp thermoelectricity based integrated bake/chill system for photoresist processingTay, A. ; Chua, H.T.; Wu, X.
3Feb-2007An in situ approach to real-time spatial control of steady-state wafer temperature during thermal processing in microlithographyTay, A. ; Ho, W.K. ; Hu, N.
42008CD uniformity control via real-time control of photoresist propertiesChen, M.; Fu, J. ; Ho, W.K. ; Tay, A. 
515-Jan-2006Control of photoresist film thickness: Iterative feedback tuning approachTay, A. ; Khuen Ho, W. ; Deng, J.; Keng Lok, B.
6Dec-2009In situ monitoring of photoresist thickness uniformity of a rotating wafer in lithographyTay, A. ; Ho, W.K. ; Wu, X.; Chen, X.
72009In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequenceWu, X.; Yang, G.; Lim, E.-X.; Tay, A. 
82007Influence of wafer warpage on photoresist film thickness and extinction coefficient measurementsWu, X.; Tay, A. 
9May-2004Integrated bake/chill module with in situ temperature measurement for photoresist processingTay, A. ; Ho, W.-K. ; Loh, A.-P. ; Lim, K.-W. ; Tan, W.-W. ; Schaper, C.D.
102010Monitoring and control of photoresist properties and CD during photoresist processingYang, G.; Ngo, Y.-S.; Putra, A.S. ; Ang, K.-T.; Tay, A. ; Fang, Z.-P.
112010Monitoring and control of photoresist properties and CD during photoresist processingYang, G.; Ngo, Y.-S.; Putra, A.S. ; Ang, K.-T.; Tay, A. ; Fang, Z.-P.
12Jul-2004On control of resist film uniformity in the microlithography processHo, W.K. ; Tay, A. ; Lee, L.L.; Schaper, C.D.
132005Real-time control of photoresist absorption coefficient uniformityTay, A. ; Ho, W.-K. ; Wu, X.; Tsai, K.-Y.
142005Real-time control of photoresist development processTay, A. ; Ho, W.-K. ; Kiew, C.-M.; Zhou, Y.; Lee, J.H.
15Jan-2007Real-time control of photoresist extinction coefficient uniformity in the microlithography processTay, A. ; Ho, W.K. ; Wu, X.
162001Spatially-programmable thermal processing module for 300 mm wafer processingTay, A. ; Khiang Wee Lim; Ai Poh Loh; Woei Wan Tan; Weng Khuen Ho; Huang, A. ; Fu, J.