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Weng Khuen Ho

rp01547

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Full Name
Weng Khuen Ho
Variants
Ho, W.-K.
Ho, Weng-Khuen
Khuen, Ho Weng
Ho, M.
Ho, Weng Khuen
Khuen Ho, W.
Ho, W.Y.
Khuen, H.W.
Ho, W.K.
 
Main Affiliation
 
Faculty
 
Email
elehowk@nus.edu.sg
 

Publications

Refined By:
Author:  Ho, W.K.
Type:  Article
Date Issued:  [2000 TO 2009]

Results 1-20 of 30 (Search time: 0.004 seconds).

Issue DateTitleAuthor(s)
1Feb-2007A multiobjective memetic algorithm based on particle swarm optimizationLiu, D.; Tan, K.C. ; Goh, C.K.; Ho, W.K. 
22004A Robust Strategy for Joint Data Reconciliation and Parameter EstimationJoe, Y.Y.; Wang, D.; Ching, C.B.; Tay, A. ; Ho, W.K. ; Romagnoli, J.
3Feb-2007An in situ approach to real-time spatial control of steady-state wafer temperature during thermal processing in microlithographyTay, A. ; Ho, W.K. ; Hu, N.
4Feb-2005Characterizing photolithographic linewidth sensitivity to process temperature variations for advanced resists using a thermal arraySchaper, C.D.; El-Awady, K.; Kailath, T.; Tay, A. ; Lee, L.L.; Ho, W.K. ; Fuller, S.E.
5Feb-2004Constraint feedforward control for thermal processing of quartz photomasks in microelectronics manufacturingTay, A. ; Ho, W.K. ; Schaper, C.D.; Lee, L.L.
6Feb-2005Context-based recognition of process states using neural networksSrinivasan, R. ; Wang, C.; Ho, W.K. ; Lim, K.W. 
715-Jan-2006Control of photoresist film thickness: Iterative feedback tuning approachTay, A. ; Khuen Ho, W. ; Deng, J.; Keng Lok, B.
8Dec-2008Critical dimension and real-time temperature control for warped wafersHo, W.K. ; Tay, A. ; Fu, J. ; Chen, M.; Feng, Y.
9Nov-2007Critical dimension uniformity via real-time photoresist thickness controlHo, W.K. ; Tay, A. ; Chen, M.; Fu, J. ; Lu, H.; Shan, X.
1028-Apr-2004Dynamic Principal Component Analysis Based Methodology for Clustering Process States in Agile Chemical PlantsSrinivasan, R. ; Wang, C.; Ho, W.K. ; Lim, K.W. 
11Jul-2005Estimation of wafer warpage profile during thermal processing in microlithographyTay, A. ; Ho, W.K. ; Hu, N.; Chen, X.
12Dec-2009In situ monitoring of photoresist thickness uniformity of a rotating wafer in lithographyTay, A. ; Ho, W.K. ; Wu, X.; Chen, X.
13Nov-2004Intelligent alarm management in a petroleum refinerySrinivasan, R. ; Liu, J. ; Lim, K.W. ; Tan, K.C. ; Ho, W.K. 
147-Jun-2006Iterative learning approach toward closed-loop automatic tuning of PID controllersTan, K.K. ; Zhao, S. ; Chua, K.Y.; Ho, W.K. ; Tan, W.W. 
15Nov-2001Minimum time control of conductive heating systems for microelectronics processingTay, A. ; Ho, W.K. ; Poh, Y.P.
1615-Apr-2005Neural network systems for multi-dimensional temporal pattern classificationSrinivasan, R. ; Wang, C.; Ho, W.K. ; Lim, K.W. 
17Jul-2004On control of resist film uniformity in the microlithography processHo, W.K. ; Tay, A. ; Lee, L.L.; Schaper, C.D.
1816-Oct-2008On solving multiobjective bin packing problems using evolutionary particle swarm optimizationLiu, D.S.; Tan, K.C. ; Huang, S.Y.; Goh, C.K.; Ho, W.K. 
1923-May-2007Optimal feed-forward control for multizone baking in microlithographyHo, W.K. ; Tay, A. ; Chen, M.; Kiew, C.M.
202000Optimal predictive control with constraints for the processing of semiconductor wafers on bake platesHo, W.K. ; Tay, A. ; Schaper, C.D.