INSTITUTE OF MICROELECTRONICS

Organization name
INSTITUTE OF MICROELECTRONICS


Results 101-120 of 138 (Search time: 0.002 seconds).

Issue DateTitleAuthor(s)
101Oct-2009Enhanced sensitivity of small-size (with 1-μm gate length) junction-field-effect-transistor-based germanium photodetector using two-step germanium epitaxy by ultrahigh vacuum chemical vapor depositionWang, J. ; Zang, H.; Yu, M.B.; Xiong, Y.Z.; Lo, G.Q.; Kwong, D.L.; Lee, S.J. 
10221-Feb-1996Electrochemical copolymerization of aniline and metanilic acidLee, J.Y. ; Cui, C.Q. 
103Mar-1995Electrical and structural studies of lithium fluorophosphate glassesChowdari, B.V.R. ; Mok, K.F. ; Xie, J.M.; Gopalakrishnan, R. 
1041996Efficient receiver structure for GSM mobile radioWesołowski, K.; Krenz, R.; Das, K. 
105Feb-1995Effect of wirebond geometry and die setting on wire sweepTay, A.A.O. ; Yeo, K.S. ; Wu, J.H. 
1061995Effect of oxide field on hot carrier induced degradation in CMOS gate oxideZhao, S.P. ; Taylor, S.
107Nov-1995Effect of micro-extraction field and physical dimensions on the charging dynamics of integrated circuit passivation layer probe-holes in the electron beam testerSim, K.S. ; Phang, J.C.H. ; Chan, D.S.H. 
1082000Effect of delamination on the thermal fatigue of solder joints in flip chipsOng, E.T.; Tay, A.A.O. ; Wu, J.H. 
1092000Dummy gated radio frequency VDMOSFET with high breakdown voltage and low feedback capacitanceXu, S.; Ren, C.; Foo, P.-D. ; Liu, Y.; Su, Y.
11021-Nov-1995Double reflection cathodoluminescence detector with extremely high discrimination against backscattered electronsCHAN, DANIEL S. H. ; LEONG, KIN ; PHANG, JACOB C. H. 
1111996Double heterostructure laser diode emitting at 1·06 μm using quaternary alloy of InGaAlAsChua, S.J. ; Ramam, A. ; Lim, N. ; Gopalakrishnan, R. ; Tan, K.L. 
1219-Aug-2008Divider apparatus and associated methodALDRIDGE, CHRISTOPHER ANTHONY ; TAN, WEE TIONG; KANG, CHIA KWANG 
13Mar-1997Die attach failures related to wafer back metal processing - An AES studyRadhakrishnan, M.K. 
142004Device reliability and failure mechanisms related to gate dielectrics and interconnectsRadhakrishnan, M.K. 
15Sep-1998Detecting underfill delamination and cracks in flip chip on board assemblies using infrared microscopeLu, J.; Trigg, A.; Wu, J. ; Chai, T.
161996Design and characterisation of a single-reflection, solid-state detector with high discrimination against backscattered electrons for cathodoluminescence microscopyPey, K.L. ; Phang, J.C.H. ; Chan, D.S.H. ; Leong, Y.K.
171993Criterion for predicting delamination in plastic IC packagesTay, A.A.O. ; Tan, G.L. ; Lim, T.B. 
18Sep-2003Correlation of failure mechanism of constant-current-stress and constant-voltage-stress breakdowns in ultrathin gate oxides of nMOSFETs by TEMPey, K.L.; Tung, C.H.; Radhakrishnan, M.K. ; Tang, L.J.; Sun, Y.; Wang, X.D.; Lin, W.H.
191999Construct GaAs FET dc model from drain-port dc power and conductanceLiu, L. ; Lin, F. ; Kooi, P.S. ; Leong, M.S. 
20Mar-1994Combining electron and focused ion beam techniques for failure analysis and design verification of integrated circuitsHeiland, R.; Leslie, A.