Browsing by Author Poon, C.H.

Showing results 1 to 8 of 8
Issue DateTitleAuthor(s)
2004Boron profile narrowing in laser-processed silicon after rapid thermal annealPoon, C.H.; Tan, L.S. ; Cho, B.J. ; See, A.; Bhat, M.
2005Dopant loss mechanism in n+/p germanium junctions during rapid thermal annealingPoon, C.H.; Tan, L.S. ; Cho, B.J. ; Du, A.Y.
Sep-2004Electrical evaluation of laser annealed junctions by Hall measurementsPoon, C.H.; Tan, L.S. ; Cho, B.J. ; Ng, K.T.; Bhat, M.; Chan, L.
5-Dec-2008Experimental and simulation study of the flash lamp annealing for boron ultra-shallow junction formation and its stabilityMok, K.R.C.; Yeong, S.H.; Colombeau, B.; Benistant, F.; Poon, C.H.; Chan, L.; Srinivasan, M.P. 
Mar-2003Multiple-pulse laser annealing of preamorphized silicon for ultrashallow boron junction formationPoon, C.H.; Cho, B.J. ; Lu, Y.F. ; Bhat, M.; See, A.
May-2004Raman spectroscopy investigation on excimer laser annealing and thickness determination of nanoscale amorphous siliconZeng, Y.P.; Lu, Y.F.; Shen, Z.X. ; Sun, W.X. ; Yu, T. ; Liu, L. ; Zeng, J.N. ; Cho, B.J. ; Poon, C.H.
2008Understanding of boron junction stability in preamorphized silicon after optimized flash annealingYeong, S.H.; Colombeau, B.; Poon, C.H.; Mok, K.R.C.; See, A.; Benistant, F.; Tan, D.X.M.; Pey, K.L.; Ng, C.M.; Chan, L.; Srinivasan, M.P. 
2008Understanding of boron junction stability in preamorphized silicon after optimized flash annealingYeong, S.H.; Colombeau, B.; Poon, C.H.; Mok, K.R.C.; See, A.; Benistant, F.; Tan, D.X.M.; Pey, K.L.; Ng, C.M.; Chan, L.; Srinivasan, M.P.