Browsing by Author Lim, P.S.

Showing results 1 to 10 of 10
Issue DateTitleAuthor(s)
23-Oct-2000Anomalous positive charge trapping in thin nitrided oxides under high-field impulse stressingLim, P.S.; Chim, W.K. 
1-Feb-2002Hole injection with limited charge relaxation, lateral nonuniform hole trapping, and transient stress-induced leakage current in impulse-stressed thin (Chim, W.K. ; Lim, P.S.
1-Feb-2002Hole injection with limited charge relaxation, lateral nonuniform hole trapping, and transient stress-induced leakage current in impulse-stressed thin (<5nm) nitrided oxidesChim, W.K. ; Lim, P.S.
1-Feb-2002Improved model for the stress-induced leakage current in thin silicon dioxide based on conduction-band electron and valence-band electron tunnelingChim, W.K. ; Lim, P.S.
Dec-2001Latent damage generation in thin oxides of metal-oxide-semiconductor devices under high-field impulse stress and damage characterization using low-frequency noise measurementChim, W.K. ; Lim, P.S.
1999Latent damage investigation on lateral non-uniform charge generation and stress-induced leakage current in silicon dioxides subjected to low-level electrostatic discharge impulse stressingLim, P.S.; Chim, W.K. 
Oct-1998Low-frequency noise characterizattion of latent damage in thin oxides subjected to high-field impulse stressingChim, W.K. ; Yeo, B.P.; Lim, P.S.; Chan, D.S.H. 
Oct-1998Low-frequency noise characterizattion of latent damage in thin oxides subjected to high-field impulse stressingChim, W.K. ; Yeo, B.P.; Lim, P.S.; Chan, D.S.H. 
1999Stress-induced leakage current and lateral nonuniform charge generation in thermal oxides subjected to negative-gate-voltage impulse stressingLim, P.S.; Chim, W.K. 
2001Stress-induced leakage current in thin oxides under high-field impulse stressingTan, Y.N.; Chim, W.K. ; Lim, P.S.