Browsing by Author Ah, L.K.

Showing results 1 to 12 of 12
Issue DateTitleAuthor(s)
Nov-1992Characterization of charge trapping in submicrometer NMOSFET's by gate capacitance measurementsLing, C.H. ; Yeow, Y.T.; Ah, L.K.
1997Correspondence between gated-diode drain current and charge pumping current in hot-carrier stressed n- and p-MOSFET'sGoh, Y.H.; Ah, L.K.; Ling, C.H. 
1995Effect of rapid thermal annealing on the structural and electrical properties of a silicon-silicon oxide systemChoi, W.K. ; Chan, Y.M.; Ah, L.K.; Loh, F.C. ; Tan, K.L. ; Ramam, A. 
May-1995Exploratory observations of effect of rapid thermal processing on silicon minority carrier lifetime using laser microwave photoconductance methodChoi, W.K. ; Ah, L.K.; Chan, Y.M.; Raman, A. 
Jul-1994Hot-electron degradation in NMOSFET's: Results from temperature annealLing, C.H. ; Ah, L.K.; Choi, W.K. ; Tan, S.E.; Ang, D.S. 
1-Jan-1993Logarithmic time dependence of pMOSFET degradation observed from gate capacitanceLing, C.H. ; Yeow, Y.T.; Ah, L.K.; Yung, W.H.; Choi, W.K. 
1-Jan-1993Logarithmic time dependence of pMOSFET degradation observed from gate capacitanceLing, C.H. ; Yeow, Y.T.; Ah, L.K.; Yung, W.H.; Choi, W.K. 
Jul-1991Observation of MOSFET degradation due to electrical stressing through gate-to-source and gate-to-drain capacitance measurementYeow, Y.T.; Ling, C.H. ; Ah, L.K.
Jul-1991Observation of MOSFET degradation due to electrical stressing through gate-to-source and gate-to-drain capacitance measurementYeow, Y.T.; Ling, C.H. ; Ah, L.K.
1995Recombination lifetime in silicon from laser microwave photoconductance decay measurementLing, C.H. ; Teoh, H.K.; Choi, W.K. ; Zhou, T.Q. ; Ah, L.K.
1995Recombination lifetime in silicon from laser microwave photoconductance decay measurementLing, C.H. ; Teoh, H.K.; Choi, W.K. ; Zhou, T.Q. ; Ah, L.K.
1995Study of rf-sputtered yttrium oxide films on silicon by capacitance measurementsLing, C.H. ; Bhaskaran, J.; Choi, W.K. ; Ah, L.K.