Browsing by Author Leitz, C.W.

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Issue DateTitleAuthor(s)
3-Apr-2006Surface NH 3 anneal on strained Si 0.5Ge 0.5 for metal-oxide-semiconductor applications with HfO 2 as gate dielectricHuang, J.; Wu, N.; Zhang, Q.; Zhu, C. ; Li, M.F. ; Tay, A.A.O. ; Cheng, Z.-Y.; Leitz, C.W.; Lochtefeld, A.