Browsing by Author TAY EE BENG,ARTHUR

Select a letter below to browse by last name or type
0-9 A B C D E F G H I J K L M N O P Q R S T U V W X Y Z


Showing results 44 to 63 of 120 < previous   next >
Issue DateTitleAuthor(s)
2012Fast optical proximity correction with timing optimization ready standard cellsQu, Y.; Heng, C.H. ; Tay, A. ; Lee, T.H. 
2004Fault detection and estimation of wafer warpage profile during thermal processing in microlithographyTay, A. ; Ho, W.K. ; Hu, N.; Zhou, Y.
2010Feedback control applied to improve convergence of performance-based optical proximity correction in advanced lithographyQu, Y.; Tay, A. ; Lee, T.H. 
Aug-2004In situ fault detection of wafer warpage in microlithographyHo, W.K. ; Tay, A. ; Zhou, Y.; Yang, K.
1-Nov-2006In situ measurement of wafer temperature using two sensors with different dynamical propertiesTan, W.W. ; Tang, J.C.; Loh, A.P. ; Tay, A. 
Dec-2009In situ monitoring of photoresist thickness uniformity of a rotating wafer in lithographyTay, A. ; Ho, W.K. ; Wu, X.; Chen, X.
2012In-situ critical dimension control during post-exposure bake with spectroscopic ellipsometryNgo, Y.S.; Qu, Y.; Tay, A. ; Lee, T.H. 
2005In-situ fault detection of wafer warpage in lithographyTay, A. ; Ho, W.K. ; Yap, C. ; Wei, C.; Tsai, K.-Y.
2005In-situ measurement & control of photoresist development in microlithographyKiew, C.M.; Tay, A. ; Ho, W.K. ; Lim, K.W. ; Zhou, Y.
2005In-situ measurement &amp; control of photoresist development in microlithographyKiew, C.M.; Tay, A. ; Ho, W.K. ; Lim, K.W. ; Zhou, Y.
2004In-situ measurement and control for photoresist processing in microlithographyTay, A. ; Ho, W.-K. ; Wu, X.; Kiew, C.-M.
2009In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequenceWu, X.; Yang, G.; Lim, E.-X.; Tay, A. 
2007In-situ monitoring of photoresist thickness contourHo, W.K. ; Wu, X.; Tay, A. ; Chen, X.
2008In-situ real-time temperature control of baking systems in lithographyWang, Y.; Chua, H.-T.; Tay, A. 
2007Influence of wafer warpage on photoresist film thickness and extinction coefficient measurementsWu, X.; Tay, A. 
May-2004Integrated bake/chill module with in situ temperature measurement for photoresist processingTay, A. ; Ho, W.-K. ; Loh, A.-P. ; Lim, K.-W. ; Tan, W.-W. ; Schaper, C.D.
2009Integrated bake/chill system for across-wafer temperature uniformity control in photoresist processingChua, H.T.; Tay, A. ; Wang, Y.
2005Integrated metrology and processes for semiconductor manufacturingHo, W.K. ; Tay, A. ; Lim, K.W.; Loh, A.P. ; Tan, W.W. 
2011Iterative feedback tuning of optical proximity correction mask in lithographyQu, Y.; Tay, A. ; Lee, T.H. 
Jul-1998Knowledge-based multivariable PID controlHo, W.K. ; Lee, T.H. ; Tay, E.B.