Browsing by Author TAY EE BENG,ARTHUR

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Issue DateTitleAuthor(s)
2007Equipment design and control of advanced thermal processing system in lithographyTay, A. ; Wang, Y.; Chua, H.T.
Mar-2010Equipment design and control of advanced thermal-processing module in lithographyTay, A. ; Chua, H.T.; Wang, Y.; Ngo, Y.S.
2010Equipment design and process control of critical dimensions in lithographyNgo, Y.S.; Yang, G.; Putra, A.S. ; Ang, K.T.; Tay, A. ; Fang, Z.P.
Jul-2005Estimation of wafer warpage profile during thermal processing in microlithographyTay, A. ; Ho, W.K. ; Hu, N.; Chen, X.
2009Evolving computer chinese chess using guided learningQuek, H.Y.; Chan, H.H.; Tan, K.C. ; Tay, A. 
Mar-2009Evolving Nash-optimal poker strategies using evolutionary computationQuek, H.; Woo, C.; Tan, K. ; Tay, A. 
2012Fast optical proximity correction with timing optimization ready standard cellsQu, Y.; Heng, C.H. ; Tay, A. ; Lee, T.H. 
2004Fault detection and estimation of wafer warpage profile during thermal processing in microlithographyTay, A. ; Ho, W.K. ; Hu, N.; Zhou, Y.
2010Feedback control applied to improve convergence of performance-based optical proximity correction in advanced lithographyQu, Y.; Tay, A. ; Lee, T.H. 
Aug-2004In situ fault detection of wafer warpage in microlithographyHo, W.K. ; Tay, A. ; Zhou, Y.; Yang, K.
1-Nov-2006In situ measurement of wafer temperature using two sensors with different dynamical propertiesTan, W.W. ; Tang, J.C.; Loh, A.P. ; Tay, A. 
Dec-2009In situ monitoring of photoresist thickness uniformity of a rotating wafer in lithographyTay, A. ; Ho, W.K. ; Wu, X.; Chen, X.
2012In-situ critical dimension control during post-exposure bake with spectroscopic ellipsometryNgo, Y.S.; Qu, Y.; Tay, A. ; Lee, T.H. 
2005In-situ fault detection of wafer warpage in lithographyTay, A. ; Ho, W.K. ; Yap, C. ; Wei, C.; Tsai, K.-Y.
2005In-situ measurement & control of photoresist development in microlithographyKiew, C.M.; Tay, A. ; Ho, W.K. ; Lim, K.W. ; Zhou, Y.
2005In-situ measurement &amp; control of photoresist development in microlithographyKiew, C.M.; Tay, A. ; Ho, W.K. ; Lim, K.W. ; Zhou, Y.
2004In-situ measurement and control for photoresist processing in microlithographyTay, A. ; Ho, W.-K. ; Wu, X.; Kiew, C.-M.
2009In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequenceWu, X.; Yang, G.; Lim, E.-X.; Tay, A. 
2007In-situ monitoring of photoresist thickness contourHo, W.K. ; Wu, X.; Tay, A. ; Chen, X.
2008In-situ real-time temperature control of baking systems in lithographyWang, Y.; Chua, H.-T.; Tay, A.