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TAY EE BENG,ARTHUR
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Showing results 87 to 106 of 120
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Issue Date
Title
Author(s)
1996
Performance and gain and phase margins of well-known PID tuning formulas
Ho, W.K.
;
Gan, O.P.
;
Tay, E.B.
;
Ang, E.L.
1996
Performance and gain and phase margins of well-known PID tuning formulas
Ho, W.K.
;
Gan, O.P.
;
Tay, E.B.
;
Ang, E.L.
Jan-2010
Performance-based optical proximity correction methodology
Teh, S.-H.
;
Heng, C.-H.
;
Tay, A.
2007
Piezo-assisted intra-cytoplasmic sperm injection: A comparative study of two penetration techniques
Putra, A.S.
;
Huang, S.
;
Tan, K.K.
;
Panda, S.K.
;
Lee, T.H.
;
Tay, A.
;
Ng, S.C.
2009
Predictive ratio control for interacting processes
Tan, K.K.
;
Tay, A.
;
Shao, Z.
;
Huang, S.
;
Lee, T.H.
Jan-2004
Processing chemically amplified resists on advanced photomasks using a thermal array
Schaper, C.D.
;
El-Awady, K.
;
Kailath, T.
;
Tay, A.
;
Lee, L.L.
;
Ho, W.-K.
;
Fuller, S.E.
Jun-2009
Public goods provision: An evolutionary game theoretic study under asymmetric information
Quek, H.-Y.
;
Tan, K.C.
;
Tay, A.
2013
RBF-based compensation method on displacement and thermal error
Tan, K.K.
;
Yang, R.
;
Er, P.V.
;
Tay, A.
;
Teo, C.S.
2005
Real-time control of photoresist absorption coefficient uniformity
Tay, A.
;
Ho, W.-K.
;
Wu, X.
;
Tsai, K.-Y.
2005
Real-time control of photoresist development process
Tay, A.
;
Ho, W.-K.
;
Kiew, C.-M.
;
Zhou, Y.
;
Lee, J.H.
Jan-2007
Real-time control of photoresist extinction coefficient uniformity in the microlithography process
Tay, A.
;
Ho, W.K.
;
Wu, X.
2008
Real-time estimation and control of CD uniformity in lithography
Tay, A.
2007
Real-time estimation and control of photoresist properties in microlithography
Wu, X.
;
Tay, A.
;
Ho, W.K.
;
Tan, K.K.
2006
Real-time monitoring of photoresist thickness contour in microlithography
Ho, W.K.
;
Chen, X.
;
Wu, X.
;
Tay, A.
2007
Real-time spatial control of photoresist development rate
Tay, A.
;
Ho, W.-K.
;
Hu, N.
;
Kiew, C.-M.
;
Tsai, K.-Y.
2006
Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography
Tay, A.
;
Ho, W.-K.
;
Hu, N.
;
Tsai, K.-Y.
;
Zhou, Y.
2018
Regression analysis of gait parameters and mobility measures in a healthy cohort for subject-specific normative values
Mikos V.
;
Yen S.-C.
;
Tay A.
;
Heng C.-H.
;
Chung C.L.H.
;
Liew S.H.X.
;
Tan D.M.L.
;
Au W.L.
Aug-2002
Resist film uniformity in the microlithography process
Ho, W.K.
;
Lee, L.L.
;
Tay, A.
;
Schaper, C.
2006
Robust real-time thin film thickness estimation
Kiew, C.M.
;
Tay, A.
;
Ho, W.K.
;
Lim, K.W.
;
Lee, J.H.
2002
Run-to-run process control for chemical mechanical polishing in semiconductor manufacturing
Da, L.
;
Kumar, V.G.
;
Tay, A.
;
Al Mamun, A.
;
Ho, W.K.
;
See, A.
;
Chan, L.