Browsing by Author WANG YUE

Showing results 1 to 11 of 11
Issue DateTitleAuthor(s)
Jul-2001Annealing effects of tantalum films on Si and SiO2/Si substrates in various vacuumsLiu, L. ; Wang, Y. ; Gong, H. 
20-Oct-2001Annealing effects of tantalum thin films sputtered on [001] silicon substrateLiu, L. ; Gong, H. ; Wang, Y. ; Wang, J. ; Wee, A.T.S ; Liu, R. 
20-Jan-2002Crystal structure and properties of CU-Al-O thin filmsWang, Y. ; Gong, H. ; Liu, L. 
Sep-2000Effect of temperature on electrochemical behavior for Cu-Al-O coatings prepared by CVDYizhong, H.; Yue, W. ; Blackwood, D.J. 
Nov-2000High-conductivity p-type transparent copper aluminum oxide film prepared by plasma-enhanced MOCVDWang, Y. ; Gong, H. 
Nov-2000High-conductivity p-type transparent copper aluminum oxide film prepared by plasma-enhanced MOCVDWang, Y. ; Gong, H. 
26-Jun-2000Nanocrystalline p-type transparent Cu-Al-O semiconductor prepared by chemical-vapor deposition with Cu(acac)2 and Al(acac)3 precursorsGong, H. ; Wang, Y. ; Luo, Y.
22-Aug-2001Optical and electrical properties of p-type transparent conducting Cu-Al-O thin films prepared by plasma enhanced chemical vapor depositionWang, Y. ; Gong, H. ; Zhu, F.; Liu, L. ; Huang, L. ; Huan, A.C.H.
24-Feb-2004P-type transparent copper-aluminum-oxide semiconductorGONG, HAO ; WANG, YUE ; HUANG, LEI 
27-Mar-2003P-type transparent copper-aluminum-oxide semiconductorGONG, HAO ; WANG, YUE ; HUANG, LEI 
20-Jan-2002Sims depth profiling analysis of Cu/Ta/SiO2 interfacial diffusion at different annealing temperatureLiu, L. ; Gong, H. ; Wang, Y. ; Wee, A.T.S. ; Liu, R.