Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.3670605
Title: Tuning of magnetization dynamics in sputtered CoFeB thin film by gas pressure
Authors: Xu, F.
Huang, Q.
Liao, Z.
Li, S.
Ong, C.K. 
Issue Date: 1-Apr-2012
Citation: Xu, F., Huang, Q., Liao, Z., Li, S., Ong, C.K. (2012-04-01). Tuning of magnetization dynamics in sputtered CoFeB thin film by gas pressure. Journal of Applied Physics 111 (7) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.3670605
Abstract: The influences of sputtering gas pressure on the high-frequency magnetization dynamics of as-sputtered CoFeB thin films are studied with permeability spectra based on the Landau-Lifshitz-Gilbert (LLG) equation. Results show that with the pressure increasing, both the anisotropy field and resonance frequency have minimums, while the initial permeability shows a maximum. The damping factor deceases monotonously with the pressure increasing, similar as with the coercivity. The high tunability of the damping factor indicates that controlling sputtering gas pressure could be an effective method in tuning the magnetization dynamics. All these dependences on gas pressure are suggested to be related to the inner stress of these sputtered films. © 2012 American Institute of Physics.
Source Title: Journal of Applied Physics
URI: http://scholarbank.nus.edu.sg/handle/10635/98944
ISSN: 00218979
DOI: 10.1063/1.3670605
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

SCOPUSTM   
Citations

11
checked on Dec 5, 2018

WEB OF SCIENCETM
Citations

12
checked on Nov 27, 2018

Page view(s)

65
checked on Nov 23, 2018

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.