Please use this identifier to cite or link to this item:
|Title:||Tuning of magnetization dynamics in sputtered CoFeB thin film by gas pressure|
|Citation:||Xu, F., Huang, Q., Liao, Z., Li, S., Ong, C.K. (2012-04-01). Tuning of magnetization dynamics in sputtered CoFeB thin film by gas pressure. Journal of Applied Physics 111 (7) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.3670605|
|Abstract:||The influences of sputtering gas pressure on the high-frequency magnetization dynamics of as-sputtered CoFeB thin films are studied with permeability spectra based on the Landau-Lifshitz-Gilbert (LLG) equation. Results show that with the pressure increasing, both the anisotropy field and resonance frequency have minimums, while the initial permeability shows a maximum. The damping factor deceases monotonously with the pressure increasing, similar as with the coercivity. The high tunability of the damping factor indicates that controlling sputtering gas pressure could be an effective method in tuning the magnetization dynamics. All these dependences on gas pressure are suggested to be related to the inner stress of these sputtered films. © 2012 American Institute of Physics.|
|Source Title:||Journal of Applied Physics|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Mar 26, 2019
WEB OF SCIENCETM
checked on Mar 18, 2019
checked on Mar 15, 2019
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.