Please use this identifier to cite or link to this item: https://doi.org/10.1179/143307509X437437
Title: Simulation for deposition of ZnO thin film layer by kinetic Monte Carlo method
Authors: Dee, C.F.
Lee, J.D.
Sow, C.H. 
Majlis, B.Y.
Hamzah, A.
Abdullah, H.
Lee, S.-K.
Keywords: Deposition
Epitaxial growth
Kinetic Monte Carlo
Simulation
Surface roughness
ZnO
Issue Date: Sep-2009
Citation: Dee, C.F., Lee, J.D., Sow, C.H., Majlis, B.Y., Hamzah, A., Abdullah, H., Lee, S.-K. (2009-09). Simulation for deposition of ZnO thin film layer by kinetic Monte Carlo method. Materials Research Innovations 13 (3) : 135-138. ScholarBank@NUS Repository. https://doi.org/10.1179/143307509X437437
Abstract: Kinetic Monte Carlo method was used to simulate the deposition of ZnO thin film layers. For this simulation, parameters for atom absorption, desorption and surface diffusion were incorporated to perform more realistic model of deposition. A new approach was used where the diffusion process was integrated as part of the deposition process. Simulations were carried out at different substrate temperatures. Two- and three-dimensional growth mechanisms were simulated using this model. Surface roughness can be estimated from the ratio of the atoms at the edge of the islands to the total surface sites. The number of Zn and O adatoms on the surface as a time function was analysed. © W. S. Maney & Son Ltd. 2009.
Source Title: Materials Research Innovations
URI: http://scholarbank.nus.edu.sg/handle/10635/98877
ISSN: 14328917
DOI: 10.1179/143307509X437437
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