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|Title:||Resist evaluation for Ni mold fabrication and proton beam writing|
Van Kan, J.A.
Proton beam writing (PBW)
|Citation:||Wang, Y.H., Malar, P., Zhao, J., Van Kan, J.A. (2013-02). Resist evaluation for Ni mold fabrication and proton beam writing. Microelectronic Engineering 102 : 40-43. ScholarBank@NUS Repository. https://doi.org/10.1016/j.mee.2012.05.003|
|Abstract:||In our experiments, we use different photoresists for proton beam writing and mold fabrication. We have fabricated Ni mold with structures down to 500 nm. We first use a fine focused proton beam to expose different photoresists, Polymethyl Methacrylate (PMMA), AR-P 3250 and ma-N 2410. After development and nickel sulfamate electroplating, the structures were faithfully transferred from the photoresists to Ni molds. © 2011 Elsevier B.V. All rights reserved.|
|Source Title:||Microelectronic Engineering|
|Appears in Collections:||Staff Publications|
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