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|Title:||Realization and simulation of high aspect ratio micro/nano structures by proton beam writing|
Van Kan, J.A.
|Citation:||Chatzichristidi, M.,Valamontes, E.,Raptis, I.,Van Kan, J.A.,Watt, F. (2007). Realization and simulation of high aspect ratio micro/nano structures by proton beam writing. Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC : 420-421. ScholarBank@NUS Repository. https://doi.org/10.1109/IMNC.2007.4456283|
|Abstract:||The application of PBW on aqueous developable - easy stripping negative chemically amplified resist is shown. Resist structures with 280nm linewidth and aspect ratio of 40 were easily resolved. Further process optimization, for higher aspect ratio resist structures at the nanoscale is under way. Complementary metallic structures will be resolved by electroplating and resist stripping. The development/integration of the PBW simulation software is in progress.|
|Source Title:||Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC|
|Appears in Collections:||Staff Publications|
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