Realization and simulation of high aspect ratio micro/nano structures by proton beam writing

Please use this identifier to cite or link to this item: https://doi.org/10.1109/IMNC.2007.4456283

Title:	Realization and simulation of high aspect ratio micro/nano structures by proton beam writing
Authors:	Chatzichristidi, M. Valamontes, E. Raptis, I. Van Kan, J.A. Watt, F.
Issue Date:	2007
Citation:	Chatzichristidi, M.,Valamontes, E.,Raptis, I.,Van Kan, J.A.,Watt, F. (2007). Realization and simulation of high aspect ratio micro/nano structures by proton beam writing. Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC : 420-421. ScholarBank@NUS Repository. https://doi.org/10.1109/IMNC.2007.4456283
Abstract:	The application of PBW on aqueous developable - easy stripping negative chemically amplified resist is shown. Resist structures with 280nm linewidth and aspect ratio of 40 were easily resolved. Further process optimization, for higher aspect ratio resist structures at the nanoscale is under way. Complementary metallic structures will be resolved by electroplating and resist stripping. The development/integration of the PBW simulation software is in progress.
Source Title:	Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC
URI:	http://scholarbank.nus.edu.sg/handle/10635/98866
ISBN:	4990247248
DOI:	10.1109/IMNC.2007.4456283
Appears in Collections:	Staff Publications

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