Please use this identifier to cite or link to this item:
|Title:||Proton beam fabrication of nickel stamps for nanoimprint lithography|
|Authors:||Ansari, K. |
Van Kan, J.A.
High aspect ratio
Proton beam writing
|Citation:||Ansari, K., Shao, P.G., Van Kan, J.A., Bettiol, A.A., Watt, F. (2005-04). Proton beam fabrication of nickel stamps for nanoimprint lithography. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms 231 (1-4) : 407-412. ScholarBank@NUS Repository. https://doi.org/10.1016/j.nimb.2005.01.091|
|Abstract:||Nickel stamps with micro and nano-scale relief features on their surfaces have been fabricated using proton beam writing coupled with nickel sulfamate electroplating. A focused beam of sub-micron 2.0 MeV protons was used to direct-write 3D patterns into spin coated PMMA resist, and a single step nickel sulfamate plating process has been used to produce metallic negatives from these patterns. The fabricated metallic stamps exhibit high aspect ratio surface patterns with smooth and vertical side-walls. Nano-indentation and atomic force microscopy (AFM) measurements of the features on the surface of the stamps indicate a hardness and side-wall roughness of 5 GPa and 7 nm respectively. Using nanoimprint lithography, the stamps fabricated using proton beam writing and electroplating have been successfully used to replicate patterns into PMMA. © 2005 Elsevier B.V. All rights reserved.|
|Source Title:||Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Jan 17, 2019
WEB OF SCIENCETM
checked on Jan 1, 2019
checked on Jan 18, 2019
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.