Please use this identifier to cite or link to this item: https://doi.org/10.1117/12.841536
Title: Novel types of silicon waveguides fabricated using proton beam irradiation
Authors: Teo, E.J. 
Yang, P.
Xiong, B.Q.
Breese, M.B.H. 
Mashanovich, G.Z.
Ow, Y.S. 
Reed, G.T.
Bettiol, A.A. 
Keywords: Electrochemical etching
Porous silicon
Silicon photonics
Silicon-on-insulator
Waveguides
Issue Date: 2010
Source: Teo, E.J., Yang, P., Xiong, B.Q., Breese, M.B.H., Mashanovich, G.Z., Ow, Y.S., Reed, G.T., Bettiol, A.A. (2010). Novel types of silicon waveguides fabricated using proton beam irradiation. Proceedings of SPIE - The International Society for Optical Engineering 7606 : -. ScholarBank@NUS Repository. https://doi.org/10.1117/12.841536
Abstract: In this work, we describe the use of a combination of proton beam irradiation and electrochemical etching to fabricate high index-contrast waveguides directly in silicon without the need for silicon-on-insulator substrate. Various types of waveguides with air or porous silicon cladding have been demonstrated. We show that porous silicon (PS) is a flexible cladding material due to the tunability of its refractive index and thickness. The Si/PS waveguide system also possesses better transmittance in the ranges of 1.2-9 and 23-200 μm, compared to Si/SiO2 waveguides. This is potentially important for mid and far-IR applications. Since it is compatible with conventional CMOS technology, this process can be used for fabrication of integrated optoelectronics circuits. © 2010 Copyright SPIE - The International Society for Optical Engineering.
Source Title: Proceedings of SPIE - The International Society for Optical Engineering
URI: http://scholarbank.nus.edu.sg/handle/10635/98818
ISBN: 9780819480026
ISSN: 0277786X
DOI: 10.1117/12.841536
Appears in Collections:Staff Publications

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