Please use this identifier to cite or link to this item: https://doi.org/10.1117/12.567602
Title: New fabrication technology for photonic crystal waveguides
Authors: Mehta, S.S.
Murthy, B.R.
Hui, Z.
Suryani
Ji, W. 
Iyer, M.K.
My, D.
Keywords: BARC etch
Diffraction orders
DUV lithography
Photonic crystals
Polygons
Issue Date: 2004
Citation: Mehta, S.S., Murthy, B.R., Hui, Z., Suryani, Ji, W., Iyer, M.K., My, D. (2004). New fabrication technology for photonic crystal waveguides. Proceedings of SPIE - The International Society for Optical Engineering 5577 (PART 2) : 550-560. ScholarBank@NUS Repository. https://doi.org/10.1117/12.567602
Abstract: We have developed a deep ultraviolet (DUV) lithography technique for fabricating super dense silicon based photonic crystals. Binary mask is used to create nano scale patterns of very high density. Based on the simulation, photonic crystals with both square and triangular lattice of air cylinders are designed and fabricated to work in communication frequency range (λ within 1.3 to 1.55μm) on amorphous silicon. In order to pattern circular hole we designed different kind of polygons on the mask and layout pattern was under sized at constant pitch. Bottom anti reflection coating (BARC) recipe was developed to improve circularity of the pattern and reduce interhole spacing.
Source Title: Proceedings of SPIE - The International Society for Optical Engineering
URI: http://scholarbank.nus.edu.sg/handle/10635/98808
ISSN: 0277786X
DOI: 10.1117/12.567602
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