Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.1815058
Title: Controlled intensity emission from patterned porous silicon using focused proton beam irradiation
Authors: Teo, E.J. 
Mangaiyarkarasi, D. 
Breese, M.B.H. 
Bettiol, A.A. 
Blackwood, D.J. 
Issue Date: 8-Nov-2004
Citation: Teo, E.J., Mangaiyarkarasi, D., Breese, M.B.H., Bettiol, A.A., Blackwood, D.J. (2004-11-08). Controlled intensity emission from patterned porous silicon using focused proton beam irradiation. Applied Physics Letters 85 (19) : 4370-4372. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1815058
Abstract: We have fabricated light emitting porous silicon micropatterns with controlled emission intensity. This has been achieved by direct write irradiation in heavily doped p-type silicon (0.02 Ω cm) using a 2 MeV proton beam, focused to a spot size of 200 nm. After electrochemical etching in hydrofluoric acid, enhanced photoluminescence is observed from the irradiated regions. The intensity of light emission is proportional to the dose of the proton beam, so the PL intensity of the micropattern can be tuned and varied between adjacent regions on a single substrate. This behavior is in contrast to previous ion beam patterning of p-type silicon, as light is preferentially created as opposed to quenched at the irradiated regions. © 2004 American Institute of Physics.
Source Title: Applied Physics Letters
URI: http://scholarbank.nus.edu.sg/handle/10635/98662
ISSN: 00036951
DOI: 10.1063/1.1815058
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