Please use this identifier to cite or link to this item: https://doi.org/10.1016/S0168-583X(99)00862-9
Title: Sub 100 nm proton beam micromachining: theoretical calculations on resolution limits
Authors: Van Kan, J.A. 
Sum, T.C. 
Osipowicz, T. 
Watt, F. 
Issue Date: Mar-2000
Citation: Van Kan, J.A., Sum, T.C., Osipowicz, T., Watt, F. (2000-03). Sub 100 nm proton beam micromachining: theoretical calculations on resolution limits. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms 161 : 366-370. ScholarBank@NUS Repository. https://doi.org/10.1016/S0168-583X(99)00862-9
Abstract: Proton beam micromachining is a novel direct-write process for the production of three-dimensional (3D) micro-structures. A focused beam of MeV protons is scanned in a pre-determined pattern over a suitable resist material (e.g. PMMA or SU-8) and the latent image formed is subsequently developed chemically. In this paper calculations on theoretical resolution limits of proton beam micromachined three-dimensional microstructures are presented. Neglecting the finite beam size, a Monte Carlo ion transport code was used in combination with a theoretical model describing the delta-ray (δ-ray) energy deposition to determine the lateral energy deposition distribution in PMMA resist material. The energy deposition distribution of ion induced secondary electrons (δ-rays) has been parameterized using analytical models. It is assumed that the attainable resolution is limited by a convolution of the spread of the ion beam and energy deposition of the δ-rays.
Source Title: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
URI: http://scholarbank.nus.edu.sg/handle/10635/98100
ISSN: 0168583X
DOI: 10.1016/S0168-583X(99)00862-9
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