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|Title:||Sputtered lithium nickel vanadium oxide (LiNiVO4) films: Chemical compositions, structural variations, target history, and anodic/cathodic electrochemical properties|
|Authors:||Reddy, M.V. |
|Keywords:||Atomic force microscopy|
|Source:||Reddy, M.V., Levasseur, A. (2010-02-15). Sputtered lithium nickel vanadium oxide (LiNiVO4) films: Chemical compositions, structural variations, target history, and anodic/cathodic electrochemical properties. Journal of Electroanalytical Chemistry 639 (1-2) : 27-35. ScholarBank@NUS Repository. https://doi.org/10.1016/j.jelechem.2009.10.034|
|Abstract:||In this paper, we report the chemical compositional variations and target surface history of lithium nickel vanadate material during RF-magnetron sputtering. Amorphous films were characterized by nuclear methods [Rutherford backscattering spectroscopy (RBS) and nuclear reaction analysis (NRA)], Auger electron spectroscopy (AES), X-ray diffraction (XRD), scanning electron microscope (SEM), atomic force microscope (AFM), and high resolution transmission electron microscopy (HTEM) techniques. Various nanostructured/porous LiNiVO4 thin film materials were obtained, depending on the composition of films, total pressure, annealing temperatures, thickness and heating time. Optimum film composition was obtained with the sputtering parameters; oxygen partial pressure (Po2) = 10 mPa, total pressure of (PAr) = 1 Pa, Rf-power = 30 W. Cathodic and anodic electrochemical properties of LiNiVO4 films were evaluated by galvanostatic cycling at constant current and cyclic voltammetry electroanalytical techniques. Electrochemical performance of the LiNiVO4 film deliver a capacity of ∼780 mA hg-1 (10th cycle), potential range, 0.02-3.0 V (anodic), at a current rate, 75 μA cm-2. In the potential range 1.2-4.5 V, deliver a capacity of 280 mA hg-1, and in the potential window, 3.0-4.8 V (cathodic), 0.6 Li are removed from the host LiNiVO4 lattice. © 2009 Elsevier B.V. All rights reserved.|
|Source Title:||Journal of Electroanalytical Chemistry|
|Appears in Collections:||Staff Publications|
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