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|Title:||Resist materials for proton micromachining|
|Authors:||Van Kan, J.A. |
|Citation:||Van Kan, J.A., Sanchez, J.L., Xu, B., Osipowicz, T., Watt, F. (1999-09-02). Resist materials for proton micromachining. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms 158 (1) : 179-184. ScholarBank@NUS Repository. https://doi.org/10.1016/S0168-583X(99)00392-4|
|Abstract:||The production of high aspect ratio microstructures is a potential growth area. The combination of deep X-ray lithography with electroforming and micromolding (i.e. LIGA) is one of the main techniques used to produce 3D microstructures. The new technique of proton micromachining employs focused MeV protons in a direct write process which is complementary to LIGA, e.g. micromachining with 2 MeV protons results in microstructures with a height of 63 μm and lateral sub-micrometer resolution in PMMA resist. The aim of this paper is to investigate the capabilities of proton micromachining as a lithographic technique. This involves the study of different types of resists. The dose distribution of high molecular weight PMMA is compared with three other types of resist: First the positive photo resist AZ P4620 will be discussed and then PMGI SF 23, which can be used as a deep UV, e-beam or X-ray resist. Finally SU-8, a new deep UV negative type of chemically amplified resist will be discussed. All these polymers are applied using the spin coating technique at thicknesses of between 1 and 36 μm.|
|Source Title:||Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms|
|Appears in Collections:||Staff Publications|
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