Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.1565182
Title: Reaction of SiO2 with hafnium oxide in low oxygen pressure
Authors: Wang, S.J.
Lim, P.C.
Huan, A.C.H.
Lu, C.L.
Chai, J.W.
Chow, S.Y.
Pan, J.S.
Li, Q.
Ong, C.K. 
Issue Date: 31-Mar-2003
Citation: Wang, S.J., Lim, P.C., Huan, A.C.H., Lu, C.L., Chai, J.W., Chow, S.Y., Pan, J.S., Li, Q., Ong, C.K. (2003-03-31). Reaction of SiO2 with hafnium oxide in low oxygen pressure. Applied Physics Letters 82 (13) : 2047-2049. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1565182
Abstract: Experiment results on a dynamic process of the chemical reaction of silica layer with oxygen deficient HfOx
Source Title: Applied Physics Letters
URI: http://scholarbank.nus.edu.sg/handle/10635/97761
ISSN: 00036951
DOI: 10.1063/1.1565182
Appears in Collections:Staff Publications

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