Please use this identifier to cite or link to this item:
Title: Quantitative analysis of a-Si1 - XCx:H thin films
Authors: Gracin, D.
Jakšić, M.
Yang, C. 
Borjanović, V.
Praček, B.
Keywords: Amorphous films
Auger spectroscopy
Carbon content
FTIR spectroscopy
Hydrogen content
Issue Date: Apr-1999
Source: Gracin, D.,Jakšić, M.,Yang, C.,Borjanović, V.,Praček, B. (1999-04). Quantitative analysis of a-Si1 - XCx:H thin films. Applied Surface Science 144-145 (0) : 188-191. ScholarBank@NUS Repository.
Abstract: The composition of a-Si1 - xCx:H films, deposited by magnetron sputtering, was measured by AES (Auger Electron Spectroscopy), RBS (Rutherford Backscattering Spectrometry) using both, protons and α-particles, ERDA (Elastic Recoil Detection Analysis) and FTIR spectroscopy. The results obtained by all three methods show agreement in CC/CSi ratio within the experimental error. However, the AES somewhat underestimates the silicon concentrations, which is discussed as a consequence of chemical bonding and matrix effects. The hydrogen concentrations obtained by ERDA are typically about 30% higher than those estimated by FTIR, possibly due to the presence of non-bonded hydrogen in the film. © 1999 Elsevier Science B.V. All rights reserved.
Source Title: Applied Surface Science
ISSN: 01694332
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

Page view(s)

checked on Jan 12, 2018

Google ScholarTM


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.