Please use this identifier to cite or link to this item: https://doi.org/10.1364/AO.46.004397
Title: Optical and physical properties of solgel-derived GeO2:SiO 2 films in photonic applications
Authors: Ho, C.K.F.
Rajni
Djie, H.S.
Pita, K.
Ngo, N.Q.
Osipowicz, T. 
Issue Date: 10-Jul-2007
Citation: Ho, C.K.F., Rajni, Djie, H.S., Pita, K., Ngo, N.Q., Osipowicz, T. (2007-07-10). Optical and physical properties of solgel-derived GeO2:SiO 2 films in photonic applications. Applied Optics 46 (20) : 4397-4406. ScholarBank@NUS Repository. https://doi.org/10.1364/AO.46.004397
Abstract: The functionality of optical components relies heavily on the composition-dependent properties of germanosilicate materials, which include the refractive index, photosensitivity, and microstructural properties. Recent studies and parallel developments are presented of germanosilicate films with composition x of Ge content (i.e., xGeO2:(1 - x)SiO2) that were synthesized by the solgel process for various integrated photonic applications undertaken. The following novel aspects are discussed with respect to the effect of composition of the glassy films (0.05 ≤ x ≤ 0.40): determination of spectral optical properties, UV imprinting of optical waveguides with relatively large index change (Δn), and quantum-well intermixing enhancement observed in InGaAs(P)/InP quantum-well optical devices. The implications of the results are discussed. © 2007 Optical Society of America.
Source Title: Applied Optics
URI: http://scholarbank.nus.edu.sg/handle/10635/97439
ISSN: 1559128X
DOI: 10.1364/AO.46.004397
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