Please use this identifier to cite or link to this item:
|Title:||Mechanisms of silicon diffusion in erbium silicide|
|Authors:||Peng, G.W. |
|Citation:||Peng, G.W., Feng, Y.P., Huan, A.C.H., Bouville, M., Chi, D.Z., Srolovitz, D.J. (2007-03-22). Mechanisms of silicon diffusion in erbium silicide. Physical Review B - Condensed Matter and Materials Physics 75 (12) : -. ScholarBank@NUS Repository. https://doi.org/10.1103/PhysRevB.75.125319|
|Abstract:||First-principles methods are employed to determine how Si diffuses in the layered metal silicide Er Si2-x. Si diffusion is found to be extraordinarily anisotropic, with the migration barrier associated with Si diffusing across Er planes nearly four times larger than within the Si planes. The activation energy for in-plane diffusion of Si decreases by 20% when Er Si2-x is grown heteroepitaxially on Si(001), as a result of the epitaxial strain. This effect is associated with how strain modifies the formation energy of the diffusing defect and changes the energy landscape of diffusion. These results are consistent with experimental observations of defect formation in heteroepitaxial Er Si2-x films on Si(001). © 2007 The American Physical Society.|
|Source Title:||Physical Review B - Condensed Matter and Materials Physics|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Jan 21, 2019
WEB OF SCIENCETM
checked on Jan 2, 2019
checked on Dec 7, 2018
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.