Please use this identifier to cite or link to this item: https://doi.org/10.1088/0957-4484/15/1/040
Title: Lithography of high spatial density biosensor structures with sub-100 nm spacing by MeV proton beam writing with minimal proximity effect
Authors: Whitlow, H.J.
Ng, M.L.
Auzelyte, V.
Maximov, I.
Montelius, L.
Van Kan, J.A. 
Bettiol, A.A. 
Watt, F. 
Issue Date: Jan-2004
Citation: Whitlow, H.J., Ng, M.L., Auzelyte, V., Maximov, I., Montelius, L., Van Kan, J.A., Bettiol, A.A., Watt, F. (2004-01). Lithography of high spatial density biosensor structures with sub-100 nm spacing by MeV proton beam writing with minimal proximity effect. Nanotechnology 15 (1) : 223-226. ScholarBank@NUS Repository. https://doi.org/10.1088/0957-4484/15/1/040
Abstract: Metal electrode structures for biosensors with a high spatial density and ∼85 nm gaps have been produced using focused megaelectronvolt (MeV) proton beam writing of poly-(methyl methacrylate) positive resist combined with metal lift-off. The minimal proximity exposure and straight proton trajectories in (∼ nm) resist layers for focused MeV proton beam writing are strongly indicative that ultimate electrode gap widths approaching a few nanometres are achievable.
Source Title: Nanotechnology
URI: http://scholarbank.nus.edu.sg/handle/10635/97076
ISSN: 09574484
DOI: 10.1088/0957-4484/15/1/040
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

SCOPUSTM   
Citations

38
checked on May 19, 2018

Page view(s)

25
checked on Mar 9, 2018

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.