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|Title:||Lithography of high spatial density biosensor structures with sub-100 nm spacing by MeV proton beam writing with minimal proximity effect|
Van Kan, J.A.
|Source:||Whitlow, H.J.,Ng, M.L.,Auzelyte, V.,Maximov, I.,Montelius, L.,Van Kan, J.A.,Bettiol, A.A.,Watt, F. (2004-01). Lithography of high spatial density biosensor structures with sub-100 nm spacing by MeV proton beam writing with minimal proximity effect. Nanotechnology 15 (1) : 223-226. ScholarBank@NUS Repository. https://doi.org/1/040|
|Abstract:||Metal electrode structures for biosensors with a high spatial density and ∼85 nm gaps have been produced using focused megaelectronvolt (MeV) proton beam writing of poly-(methyl methacrylate) positive resist combined with metal lift-off. The minimal proximity exposure and straight proton trajectories in (∼ nm) resist layers for focused MeV proton beam writing are strongly indicative that ultimate electrode gap widths approaching a few nanometres are achievable.|
|Appears in Collections:||Staff Publications|
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