Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.3224188
DC FieldValue
dc.titleLanthanide-based graded barrier structure for enhanced nanocrystal memory properties
dc.contributor.authorChan, M.Y.
dc.contributor.authorChan, T.K.
dc.contributor.authorOsipowicz, T.
dc.contributor.authorChan, L.
dc.contributor.authorLee, P.S.
dc.date.accessioned2014-10-16T09:30:29Z
dc.date.available2014-10-16T09:30:29Z
dc.date.issued2009
dc.identifier.citationChan, M.Y., Chan, T.K., Osipowicz, T., Chan, L., Lee, P.S. (2009). Lanthanide-based graded barrier structure for enhanced nanocrystal memory properties. Applied Physics Letters 95 (11) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.3224188
dc.identifier.issn00036951
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/97033
dc.description.abstractA memory structure comprising Ge nanocrystals and lanthanide-based charge trapping dielectric stack was fabricated to realize a self-aligned graded barrier structure. By exploiting efficient charge trapping of the nanocrystals embedded in the heterogeneous high- k dielectric, strong memory effect was manifested by a large counterclockwise capacitance-voltage hysteresis of 2.7 V under a low voltage operation of ±4 V. The high- k barrier with graded composition provides a favorable confinement barrier for improved hole retention with simultaneous enlargement of the memory window. © 2009 American Institute of Physics.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.3224188
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentPHYSICS
dc.description.doi10.1063/1.3224188
dc.description.sourcetitleApplied Physics Letters
dc.description.volume95
dc.description.issue11
dc.description.page-
dc.description.codenAPPLA
dc.identifier.isiut000270096900072
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