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|Title:||Ion beam irradiation induced fabrication of vertical coupling waveguides|
|Citation:||Liang, H.D., Kumar, V.S., Wu, J.F., Breese, M.B.H. (2013-04-01). Ion beam irradiation induced fabrication of vertical coupling waveguides. Applied Physics Letters 102 (13) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.4801307|
|Abstract:||Vertically coupled waveguides have been fabricated on a silicon-on-insulator platform using a combination of reactive ion etching to pattern the device layer and high-energy proton beam irradiation followed by electrochemical etching to pattern the substrate. Infra-red light can be coupled from the lower rib waveguide within the substrate into the upper waveguide within the device layer. By varying the proton energy along the lower waveguide, we have fabricated a tapered profile which is thin at the coupling region for higher efficiency and thicker towards the outer ends for easier coupling of light. A typical coupling efficiency of 26 has been achieved. © 2013 American Institute of Physics.|
|Source Title:||Applied Physics Letters|
|Appears in Collections:||Staff Publications|
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